We report on the characterization of a new type of CMOS-compatible device for terahertz solid-state biased coherent detection, which relies on a 1-µm-wide metallic slit embedded in a thin film of PECVD-grown silicon nitride.

Tomasino, A., Piccoli, R., Jestin, Y., Busacca, A., Delprat, S., Chaker, M., et al. (2018). Silicon nitride-based deep sub-λ slit for ultra-broadband THz coherent detection. In CLEO 2018 - Proceedings [10.1364/CLEO_QELS.2018.FF1E.1].

Silicon nitride-based deep sub-λ slit for ultra-broadband THz coherent detection

Tomasino, Alessandro;Busacca, Alessandro;
2018-01-01

Abstract

We report on the characterization of a new type of CMOS-compatible device for terahertz solid-state biased coherent detection, which relies on a 1-µm-wide metallic slit embedded in a thin film of PECVD-grown silicon nitride.
2018
Settore ING-INF/01 - Elettronica
978-1-943580-42-2
Tomasino, A., Piccoli, R., Jestin, Y., Busacca, A., Delprat, S., Chaker, M., et al. (2018). Silicon nitride-based deep sub-λ slit for ultra-broadband THz coherent detection. In CLEO 2018 - Proceedings [10.1364/CLEO_QELS.2018.FF1E.1].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10447/351770
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