Alessi, A., Agnello, S., Gelardi, F.M., Messina, G., Carpanese, M. (2010). Influence of Ge doping level on the EPR signal of Ge(1), Ge(2) and E’Ge defects in Ge-doped silica. In Proceedings of 8th symposium "SiO2, advanced dielectrics and related devices".

Influence of Ge doping level on the EPR signal of Ge(1), Ge(2) and E’Ge defects in Ge-doped silica

ALESSI, Antonino;AGNELLO, Simonpietro;GELARDI, Franco Mario;
2010-01-01

giu-2010
8th Symposium "SiO2, advanced dielectrics and related devices"
Varenna (Lecco)
21-23/6/2010
2010
1
Alessi, A., Agnello, S., Gelardi, F.M., Messina, G., Carpanese, M. (2010). Influence of Ge doping level on the EPR signal of Ge(1), Ge(2) and E’Ge defects in Ge-doped silica. In Proceedings of 8th symposium "SiO2, advanced dielectrics and related devices".
Proceedings (atti dei congressi)
Alessi, A; Agnello, S; Gelardi, FM; Messina, G; Carpanese, M
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10447/58085
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