In this work the photo‐oxidation of neat EVA and antimicrobial EVA/Nisin films was studied. Two EVA samples—containing two different vinyl acetate levels—were added with different amounts of nisin. The influence of the matrix type and of the nisin content on the photo‐oxidation behaviour was evaluated. The photo‐oxidation has been followed by monitoring the change of the mechanical and spectroscopic properties upon artificial exposure to UV‐B light. The results revealed that the films incorporating nisin show a better photo resistance with respect to the neat polymer. This improvement becomes weaker with decreasing the amount of nisin incorporated. Moreover the EVA 28 based films showed a much slower photo‐oxidation rate in comparison with the EVA 14 based ones.
Botta, L., Scaffaro, R., La Mantia, F.P. (2010). Photo-oxidation Behaviour of EVA Antimicrobial Films. In V International Conference on Times of Polymers (TOP) and Composites (AIP Conference Proceedings / Materials Physics and Applications).
Photo-oxidation Behaviour of EVA Antimicrobial Films
BOTTA, Luigi;SCAFFARO, Roberto;LA MANTIA, Francesco Paolo
2010-01-01
Abstract
In this work the photo‐oxidation of neat EVA and antimicrobial EVA/Nisin films was studied. Two EVA samples—containing two different vinyl acetate levels—were added with different amounts of nisin. The influence of the matrix type and of the nisin content on the photo‐oxidation behaviour was evaluated. The photo‐oxidation has been followed by monitoring the change of the mechanical and spectroscopic properties upon artificial exposure to UV‐B light. The results revealed that the films incorporating nisin show a better photo resistance with respect to the neat polymer. This improvement becomes weaker with decreasing the amount of nisin incorporated. Moreover the EVA 28 based films showed a much slower photo‐oxidation rate in comparison with the EVA 14 based ones.
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