High-aspect-ratio dielectric pillar with nanocavity backed by metal substrate in the infrared range

We investigated absorption and field enhancements of shallow nanocavities on top of high-aspect-ratio dielectric pillars in the infrared range. The structure includes a high-aspect-ratio nanopillar array of high refractive index, with nano-cavities on top of the pillars, and a metal plane at the bottom. The enhancement factor of electric field intensity reaches 3180 in the nanocavities and peak absorption reaches 99% . We also investigated the finite-size effect of the presented structure to simulate real experiments. Due to its narrow absorption bandwidth 3.5 nm, it can work as a refractive index sensor with sensitivity 297.5 nm/RIU and figure of merit 85. This paves the way to directly control light field at the nanoscales in the infrared light range. The investigated nanostructure will find applications in multifunctional photonics devices such as chips for culturing cells, refractive index sensors, biosensors of single molecule detection and nonlinear sensors.