The high-spectral-resolution detection of hard X-rays (E > 20 keV) is a challenging and nearly unexplored area in space astrophysics. Traditionally hard X-ray detectors present moderate spectral resolutions, although few tens of eV one could open new frontiers in the study of nuclear processes and high-temperature plasma dynamics in energetic processes. This can be achieved by using cryogenic microcalorimeters. Within a research activity aimed at developing arrays of neutron transmutation-doped germanium (NTD-Ge) microcalorimeters for the high-spectral-resolution detection (about 50 eV@60 keV) of hard X-rays (20 keV < E<100 keV), we developed an electroplating process to fabricate high-thickness (> 60 μm) bismuth absorber arrays. The adopted technological process and the study of related process parameters are discussed; preliminary results on produced arrays are given.
Ferruggia Bonura, S., Gulli, D., Barbera, M., Collura, A., Spoto, D., Vassallo, P., et al. (2020). Fabrication of Bismuth Absorber Arrays for NTD-Ge Hard X-ray Microcalorimeters. JOURNAL OF LOW TEMPERATURE PHYSICS, 200, 336-341 [10.1007/s10909-020-02475-6].
Fabrication of Bismuth Absorber Arrays for NTD-Ge Hard X-ray Microcalorimeters
Ferruggia Bonura, S.
;Gulli, D.;Barbera, M.;Santamaria, M.;Di Franco, F.;Zaffora, A.;Botta, L.;Lo Cicero, U.
2020-01-01
Abstract
The high-spectral-resolution detection of hard X-rays (E > 20 keV) is a challenging and nearly unexplored area in space astrophysics. Traditionally hard X-ray detectors present moderate spectral resolutions, although few tens of eV one could open new frontiers in the study of nuclear processes and high-temperature plasma dynamics in energetic processes. This can be achieved by using cryogenic microcalorimeters. Within a research activity aimed at developing arrays of neutron transmutation-doped germanium (NTD-Ge) microcalorimeters for the high-spectral-resolution detection (about 50 eV@60 keV) of hard X-rays (20 keV < E<100 keV), we developed an electroplating process to fabricate high-thickness (> 60 μm) bismuth absorber arrays. The adopted technological process and the study of related process parameters are discussed; preliminary results on produced arrays are given.File | Dimensione | Formato | |
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