A microlithographic process suited for metal patterning on cylindrical dielectric substrates has been developed. This includes all steps from metal coating to final etching, with resolution in the 5 μm range.
Lullo G., Arnone C., & Giaconia G.C. (1997). Technologies for the fabrication of cylindrical fine line devices. MICROELECTRONIC ENGINEERING, 35(1-4), 417-420.
Data di pubblicazione: | 1997 |
Titolo: | Technologies for the fabrication of cylindrical fine line devices |
Autori: | |
Citazione: | Lullo G., Arnone C., & Giaconia G.C. (1997). Technologies for the fabrication of cylindrical fine line devices. MICROELECTRONIC ENGINEERING, 35(1-4), 417-420. |
Rivista: | |
Digital Object Identifier (DOI): | http://dx.doi.org/10.1016/S0167-9317(96)00118-9 |
Abstract: | A microlithographic process suited for metal patterning on cylindrical dielectric substrates has been developed. This includes all steps from metal coating to final etching, with resolution in the 5 μm range. |
Settore Scientifico Disciplinare: | Settore ING-INF/01 - Elettronica |
Appare nelle tipologie: | 1.01 Articolo in rivista |
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