Quantifying the trade-off between useful and parasitic absorption of light for plasmonic light trapping in thin silicon films

We apply a combination of photocurrent and photothermal spectroscopic techniques to experimentally quantify the trade-off between useful and parasitic absorption of light in thin hydrogenated microcrystalline silicon (?c-Si:H) films incorporating self-assembled silver nanoparticle arrays, located at the rear side, for improved light trapping via resonant plasmonic scattering. The photothermal technique is used to measure the total absorptance while the photocurrent spectroscopy accounts only for the photons absorbed in the ?c-Si:H layer (useful absorptance); therefore, the method allows for independent quantification of the useful and parasitic absorptance of the plasmonic (or any other) light trapping structure [1]. We demonstrate that for 0.9 ?m thick ?c-Si:H film the optical losses resulting from the plasmonic light trapping are insignificant below 730 nm, above which they increase rapidly with increasing illumination wavelength. For the films deposited on nanoparticle arrays coupled with a flat silver mirror (plasmonic back reflector), we achieved a significant broadband enhancement of the useful absorption with an average useful absorption of 43% and an average parasitic absorption of 19% over 400?1100 nm wavelength range, achieving 91% of the theoretical Lambertian limit of absorption.