Nuccio, L., Agnello, S., Boscaino, R., Brichard, B. (2008). Effects of high pressure thermal treatments in Oxygen and Helium atmosphere on amorphous silicon dioxide and its radiation hardness. ??????? it.cilea.surplus.oa.citation.tipologie.CitationProceedings.prensentedAt ??????? 7th Symposium "SiO2, advanced dielectrics and related devices.

Effects of high pressure thermal treatments in Oxygen and Helium atmosphere on amorphous silicon dioxide and its radiation hardness

NUCCIO, Laura;AGNELLO, Simonpietro;BOSCAINO, Roberto;
2008-01-01

Settore FIS/01 - Fisica Sperimentale
7th Symposium "SiO2, advanced dielectrics and related devices
2008
2
Nuccio, L., Agnello, S., Boscaino, R., Brichard, B. (2008). Effects of high pressure thermal treatments in Oxygen and Helium atmosphere on amorphous silicon dioxide and its radiation hardness. ??????? it.cilea.surplus.oa.citation.tipologie.CitationProceedings.prensentedAt ??????? 7th Symposium "SiO2, advanced dielectrics and related devices.
Proceedings (atti dei congressi)
Nuccio, L; Agnello, S; Boscaino, R; Brichard, B
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/10447/98110
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